PMGI SF / LOR A / LOR B

Lift-off Resists Metal Deposition ProcessingApplications:Data strageIII-V SemiconductorsOptoelectronics and PhotovoltaicsMEMSMaterial Attributes: Removes quickly and cleanly in conventional resist strippersEnables sub 0.25µm micron bi-layer resist imagingEnables high yield, very thick (>3µm) metal lift-off processingWon't intermix when over-coated with most imaging resistsHigh thermal stability: Tg ~ 195oCSingle step development of bi-layer stack in TMAH or KOH developers