Clean Room Ovens

The speedy development in many fields of the industry such as microstructure technology, electronics, genetic engineering and biotechnology demands an extension of production facilities under cleanworking conditions. Production under clean conditions improves the standard of quality in research, development and production.

Heating and drying processes, such as during the production of integrated circuits, under the highest possible degree of cleanliness are a precondition for a low failure rate and hence for profitable results.

Many VTF clean room heating and drying ovens by Vötsch Industrietechnik GmbH have been developed in close co-operation with leading corporations in the semiconductor industry. This co-operation has resulted in products which fulfill even the highest demands in the field of clean-room technology.

the solution.....

The VTF clean room heating and drying ovens are available in a total of 7 sizes with workspace volumes between 60 l and 3,125 l and with nominal temperatures of 230 °C, 300 °C and 350 °C. The laminar flow technique creates a laminar, low-turbulence state of flow with a particularly homogeneous distribution of temperature thus ensuring optimum, reproducible production results. High-efficiency particulate air filters (HEPA) in the fresh and circulating air ducts ensure that the workspace is granted the clean room class 100 (according to US Federal Standard 209).

...with obvious advantages

- Optimum production results on account of the highest possible cleanliness corresponding to clean room class 100 in the work space

- High process temperatures of up to 350 °C under clean room conditions throughout the entire program cycle

- Homogeneous, spatial temperature distribution throughout the entire temperature range

- Shortened process cycles on account of short regeneration periods

- Outer casing sealed for installation in clean room areas

- Solutions for the integration into automated production lines also as clean room tunnel systems.