V2900 Inline double loadlock sputter system

Each system is individually designed around the needs of the end user. The systems take advantage of the latest technology, with a wide range of available options:

Wet/Dry 1st stage pumping (application dependent)
Turbo or Cryo pumps for high vacuum stages
DC (straight & pulsed) & RF magnetrons for high uniformity & usage coating

Wide range of substrate holding & heating
High accuracy gas-admittance system (for refractory & reactive sputtering).
Ion assisted deposition
Substrate etch & bias (RF/DC)